The KNF LABOPORT Vacuum Pump N 860.3 FT.40.18 is a chemically resistant pump designed for demanding laboratory and industrial applications involving humid gases. With a pumping speed of 60 liters per minute and a maximum vacuum of 4 bar, it ensures efficient and reliable operation. The pump features protection class IP 54 for enhanced durability and is powered by a 230 V / 50 Hz motor, making it suitable for a wide range of environments.
The KNF LABOPORT vacuum pump combines chemical resistance and robust design to provide reliable vacuum solutions in challenging conditions.
It is a chemically resistant pump designed for demanding laboratory and industrial applications involving humid gases. With a pumping speed of 60 liters per minute and a maximum vacuum of 4 bar, it ensures efficient and reliable operation. The pump features protection class IP 54 for enhanced durability and is powered by a 230 V / 50 Hz motor, making it suitable for a wide range of environments.
Yes. It is designed for humid gases and chemically aggressive media, and offers a pumping speed of 60 l/min and a maximum vacuum of 4 bar to support this kind of work.
It has a pumping speed of 60 l/min, a maximum vacuum of 4 bar and a voltage of 230 V / 50 Hz, and is supplied under manufacturer part number 049625/049661.
It offers IP 54, ideal for laboratory and industrial use, flow rate 3.6 m³/h / ultimate vacuum 4 mbar abs. and integrated KNF self-drying system ensures that condensate is quickly removed from the pump heads without the vacuum being altered. This significantly reduces process time and preserves the pump heads.
For humid gases and chemically aggressive media, the KNF model is the better choice, offering a pumping speed of 60 l/min, a maximum vacuum of 4 bar and a voltage of 230 V / 50 Hz. The VACUUBRAND model offers a power supply of 230 V, 50/60 Hz, an ultimate vacuum of 0.005 mbar and a pumping speed of 9 m³/h as an alternative, while the KNF model's IP 54 and ideal for laboratory and industrial use help make it a strong fit for humid gases and chemically aggressive media.
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